| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate manufacturing method reducing the misalignment between an upper layer and a lower layer even when there is substrate distortion and work-starting exposure apparatuses for the upper and lower layers have apparatus dependence in exposure distortion, in the manufacture of substrate for forming a pattern on the substrate, and to provide a system thereof. <P>SOLUTION: A corrected exposure pattern for the next work-starting lot is prepared from exposure distortion data of the mask-less exposure apparatus exposing the upper layer, alignment log data of a previous-work-start lot, and misalignment inspection data on the misalignment of the upper and lower layers of the previous-work-start lot, and the corrected exposure pattern is exposed by using the mask-less exposure apparatus. <P>COPYRIGHT: (C)2009,JPO&INPIT |
