| 发明名称 |
Methods for Formation of Substrate Elements |
| 摘要 |
The present invention relates to methods of forming substrate elements, including semiconductor elements such as nanowires, transistors and other structures, as well as the elements formed by such methods.
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| 申请公布号 |
US2009230380(A1) |
申请公布日期 |
2009.09.17 |
| 申请号 |
US20080331150 |
申请日期 |
2008.12.09 |
| 申请人 |
NANOSYS, INC. |
发明人 |
LEON FRANCISCO;LEMMI FRANCESCO;MILLER JEFFREY;DUTTON DAVID;STUMBO DAVID P. |
| 分类号 |
H01L29/66;H01L21/28;H01L21/306 |
主分类号 |
H01L29/66 |
| 代理机构 |
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