发明名称 METHOD FOR MANUFACTURING ANTIREFLECTION STRUCTURE, ANTIREFLECTION STRUCTURE, AND OPTICAL MEMBER
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a fine and smooth antireflection structure of three-dimensional shape, allowing drawing easily in a short time, the antireflection structure, and an optical member. <P>SOLUTION: The method for manufacturing the antireflection structure includes: a step for applying an electron beam resist on a substrate; a step for exposing the plurality of first linear exposure parts in parallel each other to the electron beam resist along the first direction, using an electron beam exposure light; a step for forming the plurality of second linear exposure parts in parallel each other to the electron beam resist along the second direction crossed with the first direction, using the electron beam exposure light; and a step for developing the linear exposure parts. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009210730(A) 申请公布日期 2009.09.17
申请号 JP20080052453 申请日期 2008.03.03
申请人 TOPPAN PRINTING CO LTD 发明人 NEGISHI YOSHIYUKI;TODA TOSHITAKA;NAGANO AKIRA
分类号 G02B1/11;B32B7/02;G03F7/20 主分类号 G02B1/11
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