| 摘要 |
A transparent anti-reflective article includes a transparent substrate having a first refractive index and a first surface. An anti-reflective layer is formed within the first surface of the transparent substrate through use of one of nanosphere lithography, deep ultra-violet photolithography, electron beam lithography, and nano-imprinting. The anti-reflective layer includes a subwavelength nano-structured second surface including a plurality of protuberances. Such protuberances have a predetermined maximum distance between adjacent protuberances and a predetermined height for a given wavelength such that the anti-reflective layer includes a second refractive index lower than the first refractive index to minimize light diffraction and random scattering therethrough. The predetermined height is approximately equal to a quarter of the given wavelength divided by the second refractive index.
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