| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint method capable of preventing failures in pattern transfer even without forming an interval between respective shots, and to provide a template used in the imprint method. SOLUTION: In the imprint method, when performing patterning by the irradiation of light L in a state that an uneven surface of a template 11 is brought into contact with a substrate 14 to cure a photo-curable material coated on the substrate 14. In this case, with respect to an irradiation dose for the substrate 14 per one time, the irradiation dose for a region corresponding to at least part of a pattern peripheral region which is outside the pattern-forming region of the template 11 is made smaller than the irradiation dose for the region corresponding to the pattern-forming region including the uneven pattern of the template 11. COPYRIGHT: (C)2009,JPO&INPIT
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