| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate drying device which gives a good drying performance under a simple device configuration. SOLUTION: The substrate drying device 1 includes a processing tank 20 in a chamber 10. The substrate drying device 1 is also equipped with a dry gas generation unit 45. The dry gas generation unit 45 generates vapor by heating and evaporating a water-removing agent containing 1,1,1,3,3,3-hexa fluoro-2-propanol as a component. The vapor uses nitrogen gas as a carrier gas and is transferred to a gas supply nozzle 41. The drying gas containing the vapor of 1,1,1,3,3,3-hexa fluoro-2-propanol is supplied from the gas supply nozzle 41 into the chamber 10 to form a drying gas atmosphere. A substrate W which has undergone a cleaning treatment with deionized water in the processing tank 20 is pulled up by a lifting mechanism 30 from the deionized water into the drying gas atmosphere. COPYRIGHT: (C)2009,JPO&INPIT
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