发明名称 METHOD FOR MANUFACTURING ELECTRO-OPTICAL DEVICE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To improve the yield by improving the external form precision of an electro-optical device such as a liquid crystal device, and also improve display performance of the electro-optical device, for example. <P>SOLUTION: A first cut portion (221) is formed from a cutting surface (220a) on the side that is not opposed to a liquid crystal layer (50) of the two sides of a second substrate (220) along a first external form line (250X) (a first step). Thereby, the first cut portion (221) is formed in a manner to extend continuously along the first external form line (250X) on the cutting surface (220a), instead of being formed discontinuously or partially along the first external form line (250X). More specifically, the first cut portion (221) is formed in a position near the fringe that extends in the X-direction on the side near an external circuit connection terminal (102) along the Y-direction out of a plurality of fringes of a sealing material (52). The first cut portion (221) becomes a chamfer portion (27a) when the liquid crystal device (1) is completed. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009205140(A) 申请公布日期 2009.09.10
申请号 JP20080332755 申请日期 2008.12.26
申请人 SEIKO EPSON CORP 发明人 MIYASHITA SHINICHI;WATANABE KAZUNARI
分类号 G02F1/13;G02F1/1333;G09F9/00 主分类号 G02F1/13
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