GLASS FILM, PROCESS FOR PRODUCTION THEREOF, AND OPTICAL ELECTRONIC DEVICE

摘要

Disclosed is a dense silicon oxide film having a high insulation resistance, which is a glass film having a certain level of thickness. Specifically, disclosed are a silicon oxide film, and a glass film comprising the silicon oxide film and silica particles incorporated in the silicon oxide film. The glass film can be produced by a process comprising the steps of: applying a paste comprising silica particles, an organic silicon compound which is in a liquid form at room temperature and water onto a substrate; and oxidizing the organic silicon compound in the paste.