发明名称 Co-Fe-BASED ALLOY SPUTTERING TARGET MATERIAL, AND METHOD FOR PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a Co-Fe-based alloy target material having low permeability and high using efficiency, which can obtain a strong magnetic leakage flux for forming a soft magnetic film of a Co-Fe-based alloy used for a vertical magnetic recording medium, and to provide a method for producing the same. SOLUTION: Disclosed is a Co-Fe-based alloy sputtering target material whose compositional formula in an atomic ratio is expressed by (Co<SB>X</SB>-Fe<SB>100-X</SB>)<SB>100-Y</SB>-M<SB>Y</SB>, 20≤X≤70, 4≤Y≤25, and in which the M element in the compositional formula is Nb and/or Ta. The microstructure of the sputtering target material has a sintered structure composed of a phase consisting of HCP-Co and an alloy phase composed essentially of Fe, and an Fe<SB>2</SB>M nonmagnetic Laves phase intermetallic compound is present in the alloy phase composed essentially of Fe. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009203537(A) 申请公布日期 2009.09.10
申请号 JP20080048977 申请日期 2008.02.29
申请人 HITACHI METALS LTD 发明人 FUKUOKA ATSUSHI;TAKASHIMA HIROSHI
分类号 C23C14/34;B22F3/14;B22F3/15;B22F9/08;C22C19/07;C22C33/02;C22C38/00 主分类号 C23C14/34
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