发明名称 METHOD AND COMPOSITION FOR REMOVING SODIUM-CONTAINING MATERIAL FROM MICROCIRCUIT SUBSTRATES
摘要 A method and composition for removing sodium-containing materials such as photoresist from microcircuit substrate material utilizes 1,2-Diaminocyclohexanetetracarboxylic Acid in an organic solvent.
申请公布号 CA2403730(C) 申请公布日期 2009.09.08
申请号 CA20012403730 申请日期 2001.03.19
申请人 MALLINCKRODT, INC. 发明人 SCHWARTZKOPF, GEORGE
分类号 G03F7/42;C11D7/24;C11D7/32;C11D7/34;C11D7/50;C11D11/00;C23G1/06;H01L21/027;H01L21/304;H01L21/311 主分类号 G03F7/42
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