发明名称 Load lock system for ion beam processing
摘要 A load lock system includes a first load lock defining a first chamber, a second load lock defining a second chamber, and a vacuum pumping system to vacuum pump the first and second chambers. The vacuum pumping system includes a high vacuum pump, a first valve to connect the first chamber to an inlet of the high vacuum pump in a first pumping mode, and a second valve to connect the second chamber to the inlet of the high vacuum pump in a second pumping mode. The high vacuum pump may be a turbomolecular pump. The vacuum pumping system may include a valve manifold block located between the first and second load locks. The first and second valves may be mounted in the valve manifold block. The vacuum pumping system may further include a shared water pump.
申请公布号 US7585141(B2) 申请公布日期 2009.09.08
申请号 US20050048093 申请日期 2005.02.01
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. 发明人 EVANS MORGAN;MAY DOUGLAS E.
分类号 H01L21/677 主分类号 H01L21/677
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