| 发明名称 |
Coating compositions |
| 摘要 |
Coating compositions are provided that include a component that is a product of materials comprising an amine and an anhydride and/or an anhydride derivative. Compositions of the invention are particularly useful as an underlying antireflective coating composition ("ARC") employed with an overcoated photoresist layer in the manufacture of microelectronic wafers and other electronic devices.
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| 申请公布号 |
US7582585(B2) |
申请公布日期 |
2009.09.01 |
| 申请号 |
US20040026179 |
申请日期 |
2004.12.30 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC;E.I. DUPONT DE NEMOURS AND COMPANY |
发明人 |
TREFONAS, III PETER;CHO SUNGSEO;GOFF DAVID L.;MATTHEWS J. IOAN;YUN HAO |
| 分类号 |
B01J21/18;G03F7/11;C09D5/00;C09D201/02;G03C1/76;G03F7/004;G03F7/037;G03F7/09;H01L21/027 |
主分类号 |
B01J21/18 |
| 代理机构 |
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