WAVEFRONT ABERRATION MEASURING METHOD, MASK, WAVEFRONT ABERRATION MEASURING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

A wave front aberration measuring method, a mask, a wave front aberration measuring device, an exposure apparatus, and a manufacturing method of the device are provided to detect of each diffracted light which is diffracted from each diffraction grating. A pattern comprises a pinhole which is arranged in the object plane of the optical system(10) and produces the spherical wave. A mask(11) has a plurality of diffraction gratings(17). The light(13) is illuminated to the region which covers the part of diffraction gratings. The region of the mask in which the light is illuminated and the relative position of the pattern are detected by detecting each quantity of light of diffracted each diffracted light from each diffraction grating of diffraction gratings. The alignment of the pattern and the region of the mask in which the light is illuminated are performed.