发明名称 Vertical Semiconductor Device
摘要 A vertical semiconductor device includes a semiconductor body, and first and second contacts on opposite sides of the semiconductor body. A plurality of regions are formed in the semiconductor body including, in a direction from the first contact to the second contact, a first region of a first conductivity type, a second region of a second conductivity type; and a third region of the first conductivity type. The third region is electrically connected to the second contact. A semiconductor zone of the second conductivity type and increased doping density is arranged in the second region. The semiconductor zone separates a first part of the second region from a second part of the second region. The semiconductor zone has a maximum doping density exceeding about 1016 cm-3 and a thickness along the direction from the first contact to the second contact of less than about 3 mum.
申请公布号 US2009212322(A1) 申请公布日期 2009.08.27
申请号 US20090437375 申请日期 2009.05.07
申请人 INFINEON TECHNOLOGIES AUSTRIA AG 发明人 NIEDERNOSTHEIDE FRANZ JOSEF;SCHULZE HANS-JOACHIM
分类号 H01L29/739 主分类号 H01L29/739
代理机构 代理人
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