| 摘要 |
PROBLEM TO BE SOLVED: To reduce the inflow of charged particles with low energy into an electrostatic deflector. SOLUTION: A charged beam drawing apparatus for forming a pattern by irradiating a required position on a sample 50 with a charged beam radiated from a charged particle source 10 is provided with an electrostatic deflector 32 arranged between the charged particle source and the sample and configured by arranging small deflectors in two or more stages along an optical axis direction being a locus of a charged beam which is not defected to deflect the charged beam by an electric field and an aperture mask 60 arranged between the adjacent small deflectors in the optical axis direction of the electrostatic deflector 32 and having an aperture whose aperture diameter is smaller than an opposed distance of the small deflector arranged on the downstream side of the optical axis direction in a direction orthogonal to the optical axis direction to remove charged particles with energy lower than that of the charged beam deflected by the electrostatic deflector 32. COPYRIGHT: (C)2009,JPO&INPIT
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