PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND USED FOR THE PHOTOSENSITIVE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive composition which ensures few development defects and good line edge roughness in normal exposure (dry exposure) and liquid immersion lithography.

SOLUTION: The photosensitive composition includes (A) a resin whose solubility in an alkali developer increases by the action of an acid and (A') a resin having a sulfonium structure corresponding to a compound represented by a specific general formula. The compound used for the photosensitive composition and the pattern forming method using the photosensitive composition are also provided.

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