| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas supply unit and a chemical vapor deposition apparatus with which by-products resulting from a chemical vapor deposition process is immediately exhausted, so that a high quality thin film is deposited on the surface of a deposition object, a cleaning cycle for the inside of a chamber is extended, for greater productivity. SOLUTION: The gas supply unit for supplying a reactive gas for a chemical vapor deposition can include a hot wire part configured to pyrolyze the reactive gas, an ejection part configured to eject the reactive gas towards the hot wire part, and a suction part disposed adjacent to the hot wire part and configured to suck in and exhaust a by-product of the reactive gas. COPYRIGHT: (C)2009,JPO&INPIT
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