| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve calculation accuracy of a lithography simulator. <P>SOLUTION: A database generation method has a step S1002, in which an effective light-source shape is calculated, while changing a plurality of conditions settable in an illumination optical system so as to generate an initial database, showing the effective light-source shape; a step S1004 for measuring the effective light-source shape by setting an arbitrary condition of the plurality of conditions in the illumination optical system; a step S1006 for calculating the residual-error amount between the effective light-source shape, when each of the plurality of conditions is set in the illumination optical system and the effective light-source shape included in the database, on the basis of the effective light-source shape measured in the measurement step and the effective light-source shape, belonging to the initial database generated in the generation step and corresponding to arbitrary condition; and a step S1010 for correcting the effective light-source shape included in the initial database, by using the residual-error amount calculated in the calculation step so as to use the corrected initial database as an actual database. <P>COPYRIGHT: (C)2009,JPO&INPIT |
