发明名称 REDUCING FAST IONS IN A PLASMA RADIATION SOURCE HAVING A SECOND ACTIVATION SOURCE
摘要 Reducing Fast Ions in a Plasma Radiation Source A radiation source with an anode and a cathode to create a discharge in a discharge space between the anode and the cathode is disclosed. A plasma is formed in the radiation source which generates electromagnetic radiation, such as EUV radiation. The radiation source includes a first activation source to direct a first energy pulse onto a first spot in the radiation source near the discharge space to create a main plasma channel which triggers the discharge. The radiation source also has a second activation source to direct a second energy pulse onto a second spot in the radiation source near the discharge space to create an additional plasma channel. By directing the second energy pulse during the same discharge, a shortcutting of the main plasma current is realized which in turn may reduce the amount of fast ions produced. ® KIPO & WIPO 2009
申请公布号 KR20090091195(A) 申请公布日期 2009.08.26
申请号 KR20097012829 申请日期 2007.12.19
申请人 ASML NETHERLANDS B.V. 发明人 IVANOV VLADIMIR VITALEVITCH;BANINE VADIM YEVGENYEVICH;KOSHELEV KONSTANTIN NIKOLAEVITCH
分类号 H05G2/00;G03F7/20 主分类号 H05G2/00
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