| 摘要 |
An arcless, atmospheric-pressure plasma generating apparatus (10) capable of producing a large-area, temperature-controlled, stable discharge (20) at power densities between about 0.1 W/cm3 and about 200 W/cm3, while having an operating gas temperature of less than 50 C, for processing materials (28) outside of the discharge, is described. The apparatus produces active chemical species, including gaseous metastables and radicals which may be used for polymerization (either free radical-induced or through dehydrogenation-based polymerization), surface cleaning and modification, etching, adhesion promotion, and sterilization, as examples. The invention may include either a cooled rf-driven electrode (12) or a cooled ground electrode (22), or two cooled electrodes, wherein active components of the plasma may be directed out of the plasma and onto an external workpiece (28) without simultaneously exposing a material to the electrical influence or ionic components of the plasma. |
