发明名称 SURFACE INSPECTION DEVICE AND METHOD FOR SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To improve accuracy in discriminating between foreign matter and crystal defects or between foreign matter and scratches existing on the surface of a substrate. SOLUTION: Optical systems 5a, 6a irradiate the surface of the substrate W with laser beams, receive scattered light of the laser beams at different angles, and output first and second received light signals D1, D2. A data processing means 4 sets a reference function for defining the correlation between the levels of the first and second received light signals D1, D2, compares the levels of the first and second received light signals D1, D2 using the reference function as a comparison reference, and determines based on the compared result whether a defect existing on the surface of a semiconductor substrate corresponds to any of multiple kinds of different defects. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009186492(A) 申请公布日期 2009.08.20
申请号 JP20090125388 申请日期 2009.05.25
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SATO TATSUYA;KATO YUICHIRO;MITOMO KENJI
分类号 G01N21/956 主分类号 G01N21/956
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