发明名称 LIQUID PROCESSING APPARATUS
摘要 A liquid processing apparatus, capable of preventing a cleaning solution from remaining on a lifting member of a target object, thereby preventing an attachment of a cleaning solution to an opposite surface of a target object, and preventing an inflow of the cleaning solution into an inert gas supply part to efficiently supply the inert gas to the object, is disclosed. The liquid processing apparatus includes a hollow-shaped support plate to support an object, a hollow-shaped rotary shaft fixedly connected to the support plate, a rotary drive part to rotate the rotary shaft in a predetermined rotating direction, and a lift pin plate arranged in a hollow of the support plate to have lift pins supporting a main body and the processed object. A cleaning solution supply part to supply a cleaning solution and an inert gas supply part to supply an inert gas are extended in a hollow of the rotary shaft. The lift pin plate includes an inclined surface, and the front end of the inert gas supply part is positioned in a position higher than that of the front end of the cleaning solution supply part.
申请公布号 US2009205155(A1) 申请公布日期 2009.08.20
申请号 US20090371126 申请日期 2009.02.13
申请人 TOKYO ELECTRON LIMITED 发明人 ITOH NORIHIRO;NANBA HIROMITSU
分类号 B08B1/00 主分类号 B08B1/00
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