| 摘要 |
A mask suitable for use with a particle beam source such as ion or electron source for forming features and structures and writing on surfaces of materials. The mask comprising an aperture plate, having a plurality of apertures, and focusing means disposed to underlie the aperture plate. The plurality of apertures forming an array whereby each plate aperture is adapted to receive a portion of a particle beam incident on the aperture plate. Each portion of particle beam then passes through focusing means through which the portion of beam is focused onto the surface. The mask thereby forming a plurality of high resolution simultaneously operable focused particle beams.
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