| 发明名称 |
ANALYZING METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for analyzing pattern failure of a substrate that has been exposed. <P>SOLUTION: The method for analyzing pattern failure includes: exposing of a substrate with exposure light through an optical member under a predetermined exposure condition; detecting information of the pattern formed on the substrate by exposure; and analyzing a cause of the pattern failure formed on the substrate based on the exposure condition and pattern information. <P>COPYRIGHT: (C)2009,JPO&INPIT |
| 申请公布号 |
JP2009188062(A) |
申请公布日期 |
2009.08.20 |
| 申请号 |
JP20080024447 |
申请日期 |
2008.02.04 |
| 申请人 |
NIKON CORP |
发明人 |
NAKANO KATSUSHI |
| 分类号 |
H01L21/027;G03F7/20;H01L21/66 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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