| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aligner that can be miniaturized and can perform maskless exposure by stable operation. <P>SOLUTION: The aligner 10 includes: a light source 12; an MEMS optical scanner for inclining mirrors M1, M2 repeatedly; and an exposure optical system for exposing an object to be exposed to light to light from the light source via the mirrors. Light from the light source is applied to the object to be exposed to light by two-dimensional scanning for scanning in two directions on the object to be exposed to light by the mirrors inclined using the MEMS optical scanner. <P>COPYRIGHT: (C)2009,JPO&INPIT |
