METHOD FOR PRODUCTING SUBSTRATE

摘要

A method for manufacturing a substrate is provided to improve ashing efficiency by preventing a chemical coupling change of a photoresist. A substrate in which a photoresist is formed is heated(S120). A first plasma ashing process is performed about the substrate(S130). A temperature of the substrate is fallen at an atmosphere pressure state(S150). A second plasma ashing process is performed about the substrate(S160). A supporting member installed inside a chamber is heated. The substrate is heated in state internal pressure of the chamber is maintained into the atmosphere pressure.