发明名称 |
PROZESS ZUR HERSTELLUNG VON PHOTONISCHEN KRISTALLEN |
摘要 |
A process comprises (a) providing a substantially inorganic photoreactive composition comprising (1) at least one cationically reactive species, (2) a multi-photon photoinitiator system, and (3) a plurality of precondensed, inorganic nanoparticles; (b) exposing, using a multibeam interference technique involving at least three beams, at least a portion of the photoreactive composition to radiation of appropriate wavelength, spatial distribution, and intensity to produce a two-dimensional or three-dimensional periodic pattern of reacted and non-reacted portions of the photoreactive composition; (c) exposing at least a portion of the non-reacted portion of the photoreactive composition to radiation of appropriate wavelength and intensity to cause multi-photon absorption and photoreaction to form additional reacted portion; (d) removing the non-reacted portion or the reacted portion of the photoreactive composition to form interstitial void space; and (e) at least partially filling the interstitial void space with at least one material having a refractive index that is different from the refractive index of the remaining portion. |
申请公布号 |
AT439612(T) |
申请公布日期 |
2009.08.15 |
申请号 |
AT20030819269T |
申请日期 |
2003.12.05 |
申请人 |
3M INNOVATIVE PROPERTIES COMPANY |
发明人 |
ANDERSON, MARK;LEATHERDALE, CATHERINE;THOMPSON, SCOTT |
分类号 |
G02B6/12;C30B29/60;C30B33/00;G02B6/122;G02B6/138;G03F7/004;G03F7/038;G03F7/20;G03F7/40 |
主分类号 |
G02B6/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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