发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a diode which has high withstand voltage characteristics equal to those of a GaN-based FET, and has low on-state resistance. SOLUTION: A semiconductor device 1 includes a silicon diode 3 having low withstand voltage characteristics and a GaN-based HEMT 5 having high withstand voltage characteristics and is formed of a GaN-based compound semiconductor capable of operating with low loss, wherein the source electrode of the GaN-based HEMT5 is connected to the cathode side of the silicon diode 3 and the gate electrode of the GaN-based HEMT5 is connected to the anode side of the silicon diode 3. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009182107(A) 申请公布日期 2009.08.13
申请号 JP20080019071 申请日期 2008.01.30
申请人 FURUKAWA ELECTRIC CO LTD:THE 发明人 SATO YOSHIHIRO;KAYA HIDESUKE
分类号 H01L27/095;H01L21/28;H01L29/861 主分类号 H01L27/095
代理机构 代理人
主权项
地址
您可能感兴趣的专利