| 摘要 |
PROBLEM TO BE SOLVED: To provide a deposited film formation method and a device therefor with which a satisfactory deposited film having reduced film defects and characteristic unevenness can be deposited at high speed, and further, production of image defects such as the production of black spots in image formation using an electrophotographic photoreceptor is suppressed, so that image characteristics can be improved. SOLUTION: Disclosed is a deposited film formation method including: a first step where, in a state that deposited film forming objects 10 are supported to a first conductor 20A and a second conductor 20B arranged so as to be separated from each other respectively, the deposited film forming objects 10 are stored in a reaction chamber 3; a second step where the reaction chamber 3 is made into a reaction gas atmosphere; and a third step where pulse-like d.c. voltage is applied to a space between the first conductor 20A and the second conductor 20B in such a manner that a state where the potential of the first conductor 20A is made higher than that of the second conductor 20A and a state where the potential of the second conductor 20B is made higher than that of the first conductor 20A are alternately repeated. COPYRIGHT: (C)2009,JPO&INPIT
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