发明名称 |
METHOD OF MANUFACTURING FERROELECTRIC MEMORY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a ferroelectric capacitor, with which a low voltage operation is made possible by thinning a ferroelectric film. SOLUTION: The method of manufacturing a ferroelectric memory device includes: a step of forming a first electrode layer 12a above a substrate; a step of forming a first ferroelectric layer on the first electrode layer 12a; a step of forming an amorphous layer 16a on the first ferroelectric layer; a step of forming a second electrode layer 14a on the amorphous layer 16a; and a step of crystallizing the amorphous layer 16a and turning it to a second ferroelectric layer. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2009182309(A) |
申请公布日期 |
2009.08.13 |
申请号 |
JP20080022872 |
申请日期 |
2008.02.01 |
申请人 |
SEIKO EPSON CORP |
发明人 |
NAWANO MASAHISA;TAMURA HIROAKI;KUROKAWA KENICHI |
分类号 |
H01L21/8246;H01L21/316;H01L27/105 |
主分类号 |
H01L21/8246 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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