发明名称 METHOD OF MANUFACTURING FERROELECTRIC MEMORY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a ferroelectric capacitor, with which a low voltage operation is made possible by thinning a ferroelectric film. SOLUTION: The method of manufacturing a ferroelectric memory device includes: a step of forming a first electrode layer 12a above a substrate; a step of forming a first ferroelectric layer on the first electrode layer 12a; a step of forming an amorphous layer 16a on the first ferroelectric layer; a step of forming a second electrode layer 14a on the amorphous layer 16a; and a step of crystallizing the amorphous layer 16a and turning it to a second ferroelectric layer. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009182309(A) 申请公布日期 2009.08.13
申请号 JP20080022872 申请日期 2008.02.01
申请人 SEIKO EPSON CORP 发明人 NAWANO MASAHISA;TAMURA HIROAKI;KUROKAWA KENICHI
分类号 H01L21/8246;H01L21/316;H01L27/105 主分类号 H01L21/8246
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