发明名称 Dimensional stabilization of precision etched masks
摘要 Dimensional stabilization of a precision etched mask used in the production of organic light emitting diode display panels. This may entail securing a sheet of mask material, and then heating the sheet of mask material to a temperature within a predetermined range for a predetermined amount of time to produce a treated sheet of mask material. The treated sheet of mask material may then be used to fabricate a dimensionally stable precision etched mask, such as by exposing and etching the treated sheet of mask material.
申请公布号 US2009202922(A1) 申请公布日期 2009.08.13
申请号 US20080216047 申请日期 2008.06.27
申请人 SONY CORPORATION;SONY ELECTRONICS INC. 发明人 HARKLEROAD GARY L.;VACCARO ROBERT
分类号 G03F1/00 主分类号 G03F1/00
代理机构 代理人
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