发明名称
摘要 PROBLEM TO BE SOLVED: To provide a treating method and a treating device of a developer waste liquid that can easily separate a resin component in the developer waste liquid of a photosensitive resin plate. SOLUTION: In the treating method of a developer waste liquid containing a photosensitive resin and a surfactant, the resin component is separated from the developer waste liquid by treating to decrease the effect of the surfactant. Then, the developer waste liquid is irradiated with UV rays of 300 to 400 nm wavelength to harden the resin component in the waste liquid, and the obtd. solid content is removed.
申请公布号 JP4314331(B2) 申请公布日期 2009.08.12
申请号 JP19980224142 申请日期 1998.08.07
申请人 发明人
分类号 G03F7/26;G03F7/30;C02F1/32;C02F1/58;G03F7/00;G03F7/32 主分类号 G03F7/26
代理机构 代理人
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