发明名称 Synthetic fused silica glass member
摘要 <p>There is disclosed a synthetic fused silica member used at a wavelength of 200 nm or less which has a hydroxyl group-content of 1 to 50 ppm and a fluorine-content of 100 to 1000 ppm, and contains no chlorine, and has a birefringence of the synthetic fused silica member of 2 nm/cm or less. The synthetic fused silica member can be used as a synthetic fused silica substrate for photomask, or in an optical system wherein a fluorine excimer laser is used as a light source. There can be provided a synthetic fused silica member which can efficiently transmit a light having a wavelength as 200 nm or less, especially fluorine excimer laser (157 nm), and does not suffer from lowering of transmittance due to damage.</p>
申请公布号 EP1035084(B1) 申请公布日期 2009.08.12
申请号 EP20000105107 申请日期 2000.03.10
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 OTSUKA, HISATOSHI;SHIROTA, KAZUO;KUMAKURA, KAZUHIRO
分类号 C03C3/06;H01L21/027;C03B19/14;C03B20/00;G03F1/60;H01S3/00;H01S3/225 主分类号 C03C3/06
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