发明名称 |
Synthetic fused silica glass member |
摘要 |
<p>There is disclosed a synthetic fused silica member used at a wavelength of 200 nm or less which has a hydroxyl group-content of 1 to 50 ppm and a fluorine-content of 100 to 1000 ppm, and contains no chlorine, and has a birefringence of the synthetic fused silica member of 2 nm/cm or less. The synthetic fused silica member can be used as a synthetic fused silica substrate for photomask, or in an optical system wherein a fluorine excimer laser is used as a light source. There can be provided a synthetic fused silica member which can efficiently transmit a light having a wavelength as 200 nm or less, especially fluorine excimer laser (157 nm), and does not suffer from lowering of transmittance due to damage.</p> |
申请公布号 |
EP1035084(B1) |
申请公布日期 |
2009.08.12 |
申请号 |
EP20000105107 |
申请日期 |
2000.03.10 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
OTSUKA, HISATOSHI;SHIROTA, KAZUO;KUMAKURA, KAZUHIRO |
分类号 |
C03C3/06;H01L21/027;C03B19/14;C03B20/00;G03F1/60;H01S3/00;H01S3/225 |
主分类号 |
C03C3/06 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|