发明名称 |
Wafer alignment method for dual beam system |
摘要 |
A gradient charged particle beam apparatus capable of moving highly accurately to a specific position by eliminating influences of warp inside a wafer surface is provided. A portion 46 having a mark 47 for aligning visual field alignment positioned in advance to the same horizontal and the same height as a stage plane as a reference point is arranged on a wafer holder. A height of an observation point on a sample is adjusted to the height of the mark 47 and the visual field of a gradient column is brought into conformity with the visual field of a vertical column by use of a known offset between the gradient column and the vertical column at that time.
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申请公布号 |
US7573049(B2) |
申请公布日期 |
2009.08.11 |
申请号 |
US20070987828 |
申请日期 |
2007.12.05 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
KAGA HIROYASU;SUZUKI HIROYUKI;HOJYO YUTAKA |
分类号 |
H01J37/28 |
主分类号 |
H01J37/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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