RADIATION-CURABLE AND DEVELOPABLE POLYURETHANE AND RADIATION-CURABLE AND DEVELOPABLE PHOTORESIST COMPOSITION CONTAINING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a polyurethane and a photoresist curable and developable by the irradiation of radiation rays.

SOLUTION: The polyurethane polymer is a specific polyurethane having a carboxylic acid group in the main chain and an acryloyl group and a carboxylic acid group in the side chain and also having a weight-average molecular weight (Mw) measured by gel permeation chromatography (GPC) in the range of 3,000-400,000 and an acid number of 5-120 mgKOH/g. The photoresist composition uses the polymer as a main component.

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