MANUFACTURING METHOD OF BORON-DOPED MATERIAL FOR SEMICONDUCTOR

摘要

PROBLEM TO BE SOLVED: To provide an inexpensive boron-doped material for a semiconductor in which quality of material is uniform, and the quantity of volatilizing boron is stable for every usage. SOLUTION: This manufacturing method of a boron-doped material for a semiconductor includes processes of converting material powder containing boron-containing crystalline glass powder to slurry; providing a green sheet by molding the provided slurry; and sintering the green sheet. COPYRIGHT: (C)2009,JPO&INPIT