发明名称 EXPOSURE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To engrave into a recording medium with high resolution as well as at high speed while holding cost down. <P>SOLUTION: In shallow engraving, a smooth line can be drawn by engraving by scanning with a laser beam LB between the scanning lines of a laser beam LA. In deep engraving, laser output (power) is increased and, after engraving is performed up to a first depth Y2 with the laser beam LA, engraving is performed up to a second depth Y3 (desired depth Y3 in deep engraving) with the laser beam LB. In other words, with a single exposure head 30, shallow engraving (precision engraving) with high resolution and deep engraving at high speed can be made compatible. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009172658(A) 申请公布日期 2009.08.06
申请号 JP20080015460 申请日期 2008.01.25
申请人 FUJIFILM CORP 发明人 MIYAGAWA ICHIRO
分类号 B23K26/00;B23K26/08;G03F7/20 主分类号 B23K26/00
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