发明名称 APPARATUS OF MANUFACTURING SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To promptly change a temperature of a lower electrode on which a semiconductor substrate is mounted. SOLUTION: An apparatus 1 of manufacturing a semiconductor has: a lower electrode 4 arranged in a chamber 2 to mount a semiconductor substrate 9 with a fluid flowing path 10 for making a fluid flow therein; a plurality of temperature adjustment equipments 18 and 19 supplying fluids having different setting temperatures from each other; and switching means 11 and 12 selecting one fluid from among fluids having a plurality of setting temperatures supplied from a plurality of pieces of temperature adjustment equipment 18 and 19, and switching to make the selected fluid flow to the fluid flowing path 10 of the lower electrode 4. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009177070(A) 申请公布日期 2009.08.06
申请号 JP20080016328 申请日期 2008.01.28
申请人 TOSHIBA CORP 发明人 SHIMA SHINYA
分类号 H01L21/3065;C23C16/46;C23C16/50;H01L21/205;H01L21/683 主分类号 H01L21/3065
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