MONOMER, RESIN, RESIST COMPOSITION USING THE RESIN, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a resin containing a sulfonium salt-containing side chain as an acid generating side chain free from the deterioration of transparency or acid reactivity necessary for a resist and small in the elution or degassing causing device contamination and a monomer as the structural component of the resin.

SOLUTION: The monomer is expressed by general formula (1). In general formula (1), each of R1and R3is one of -H group and -CH3group and can be the same as or different from each other, R2represents one of phenyl group and adamantyl group and Q1represents a 1-4C perfluoroalkyl group.

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