| 摘要 |
Deposition apparatus are described herein that include at least one coil, at least one coil set, at least one coil-related apparatus, at least one target-related apparatus or a combination thereof, wherein the at least one coil, at least one coil set, at least one coil-related apparatus, at least one target-related apparatus or a combination thereof comprises a surface, and wherein at least part of the surface comprises a regular depth pattern. Methods of producing a coil, coil set or a coil-related apparatus, at least one target-related apparatus are also disclosed herein that comprise: providing at least one coil, at least one coil set, at least one coil-related apparatus, at least one target-related apparatus or a combination thereof, wherein the at least one coil, at least one coil set, at least one coil-related apparatus, at least one target-related apparatus or a combination thereof comprises a surface, providing a patterning tool; and utilizing the patterning tool to create a regular depth pattern in at least part of the surface.
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