| 摘要 |
<p>An exposure apparatus is provided to arrange patterns for measuring aberration which are used for measurement of aberration of a projection optical system. An exposure apparatus comprises a measuring system measuring the aberration of a projection optical system. The measuring system comprises a first pattern for measuring aberration arranged on the disc stage; a second pattern for measuring aberration arranged on a substrate stage; a third pattern arranged on the substrate stage to arrange the first pattern and the second pattern; a fourth pattern which is arranged on the substrate stage in order to arrange the first pattern and the second pattern; a detecting system detecting a relative position between the fourth pattern and the third pattern; a detecting system detecting the relative position between the fourth pattern and the third pattern; and a controller controlling at least one of the disk stage and substrate stage.</p> |
