| 摘要 |
<p>A liquid processing apparatus is provided to accurately adjust the resist state and improve the uniformity of the coated film thickness. The coating liquid nozzle(10) forms the flow path(105) of the coating solutions supplied from the coating solutions feed port and the coating solutions is discharged toward the substrate holding unit. The nozzle transferring unit transfers the coating liquid nozzle. The apparatus includes the light source for illuminating the coating liquid nozzle. The coating liquid nozzle is made of the cylindrical form of the transparent member. A part of the outer periphery of the cylindrical form has the light-in surface(101a).</p> |
