| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device and a method of manufacturing the semiconductor device facilitating to measure the dimensions of a specific pattern specified in advance from among a plurality of patterns when measuring the dimensions of a pattern constituting the semiconductor device using a length measuring device. SOLUTION: There are provided on a semiconductor substrate a plurality of first patterns 12a to 12d and 12f to 12i arrayed periodically and repeatedly and a second pattern 12e that is provided in a predetermined position in the array in place of the first pattern and into which part of the planar shape of the first pattern has been changed, and which has a planar shape different from the first pattern. The second pattern 12e has a planar shape on which the electrical characteristics of part of a semiconductor device configured by the second pattern 12e is substantially the same as those of part of a semiconductor device configured by the first pattern. COPYRIGHT: (C)2009,JPO&INPIT
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