| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion milling apparatus where ion beam ends up irradiating other than a testpiece is reduced to a minimal extent and a processing efficiency is improved. SOLUTION: The ion milling apparatus is provided with an ion beam source for emitting ion beams and a testpiece holder for fixing the testpiece, and a mask is provided for shielding a part of the testpiece, and a non-axially symmetric lens is arranged between the ion beam source and the mask, and the ion beam is deformed to meet a desired range for processing the testpiece. COPYRIGHT: (C)2009,JPO&INPIT
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