发明名称 ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, AND RUGGED PATTERN CARRIER
摘要 PROBLEM TO BE SOLVED: To highly precisely and speedily write a servo pattern and a groove pattern in fine patterns of a discrete track medium with a constant exposure. SOLUTION: A fine pattern, to be formed on a discrete track medium, which includes servo patterns 12, each constituted by servo elements 13, and groove patterns 15, each for separating adjacent data tracks, is formed on a substrate 10 applied with a resist 11 by scanning an electron beam EB on the substrate. While rotating the substrate in one direction, the electron beam is X-Y deflected to scan servo elements 13 corresponding to a plurality of tracks during one rotation of the substrate. Each groove pattern 15 is set as a line-up of a plurality of groove elements 16 divided at a predetermined angle, and groove elements 16 corresponding to the plurality of tracks following the writing of the servo patterns 12 are sequentially written by deflection scanning the electron beam largely in a circumferential direction X during the same rotation to write consecutive groove patterns 15. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009170044(A) 申请公布日期 2009.07.30
申请号 JP20080007941 申请日期 2008.01.17
申请人 FUJIFILM CORP 发明人 KOMATSU KAZUNORI;USA TOSHIHIRO
分类号 G11B5/84;G03F7/20;G11B5/65;G11B5/82;H01J37/147;H01J37/305;H01L21/027 主分类号 G11B5/84
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