发明名称 FERROELECTRIC MEMORY DEVICE
摘要 Provided is a ferroelectric memory device. The ferroelectric memory device includes an inorganic channel pattern on a substrate, a source electrode and a drain electrode spaced apart from each other on the substrate and contacting the inorganic channel pattern, a gate electrode disposed adjacent to the inorganic channel pattern, and an organic ferroelectric layer interposed between the inorganic channel pattern and the gate electrode.
申请公布号 US2009189152(A1) 申请公布日期 2009.07.30
申请号 US20090354990 申请日期 2009.01.16
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO BYEONG-OK;LEE MOON-SOOK;RYOO MAN-HYOUNG;KIM JUNG-HYEON;YASUE TAKAHIRO
分类号 H01L51/00;H01L29/76 主分类号 H01L51/00
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