| 摘要 |
An automatic method (100) of in-situ cleaning a processing system (211) including a process chamber (213) pumped by a roughing pump (219) and a turbomolecular pump (217) includes the steps of automatically performing a first RF plasma clean (110) (referred to herein as a chamber clean) to clean the process chamber, wherein the turbomolecular pump (217) is isolated and the roughing pump (219) pumps the processing chamber (213). The turbomolecular pump (217) is automatically switched on to pump the processing chamber (213). While the turbomolecular pump is pumping the processing chamber (213), a second RF plasma clean (115) (referred to herein as an automatic turbo clean) is performed clean the turbomolecular pump (217). In embodiments of the invention the turbo clean (115) automatically sets at least one gas flow, an RF power, and a pressure in the chamber (213).
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