发明名称 FILM TYPE TRANSFER MATERIAL
摘要 Disclosed is a film type photosensitive transfer material including a base film, a resin protective layer, a photosensitive resin layer and a cover film, in which the resin protective layer has adhesion of 0.005 kgf /cm2 or less. When the film type photosensitive transfer material is applied on a printed circuit board, it is possible to perform an exposure process in a state in which a base film is removed, and thus an interval between a mask and a photosensitive resin layer can be narrowed in the exposure process, thereby improving the resolution of a pattern. The film type photosensitive transfer material allows the base film to be removed before the exposure process, and can be processed in sheets or can be applied to a roll-to-roll process.
申请公布号 WO2009054705(A3) 申请公布日期 2009.07.30
申请号 WO2008KR06318 申请日期 2008.10.24
申请人 KOLON INDUSTRIES, INC.;MOON, HEE WAN;JHO, SEUNG JE;LEE, BYEONG IL 发明人 MOON, HEE WAN;JHO, SEUNG JE;LEE, BYEONG IL
分类号 G03F7/004;C08J5/18 主分类号 G03F7/004
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