发明名称 |
FILM TYPE TRANSFER MATERIAL |
摘要 |
Disclosed is a film type photosensitive transfer material including a base film, a resin protective layer, a photosensitive resin layer and a cover film, in which the resin protective layer has adhesion of 0.005 kgf /cm2 or less. When the film type photosensitive transfer material is applied on a printed circuit board, it is possible to perform an exposure process in a state in which a base film is removed, and thus an interval between a mask and a photosensitive resin layer can be narrowed in the exposure process, thereby improving the resolution of a pattern. The film type photosensitive transfer material allows the base film to be removed before the exposure process, and can be processed in sheets or can be applied to a roll-to-roll process.
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申请公布号 |
WO2009054705(A3) |
申请公布日期 |
2009.07.30 |
申请号 |
WO2008KR06318 |
申请日期 |
2008.10.24 |
申请人 |
KOLON INDUSTRIES, INC.;MOON, HEE WAN;JHO, SEUNG JE;LEE, BYEONG IL |
发明人 |
MOON, HEE WAN;JHO, SEUNG JE;LEE, BYEONG IL |
分类号 |
G03F7/004;C08J5/18 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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