发明名称 PASTING APPARATUS OF SUBSTRATE BODY, AND TREATING METHOD OF SUBSTRATE BODY
摘要 PROBLEM TO BE SOLVED: To provide a pasting apparatus of a substrate body and a treating method of the substrate body, in which the rigidity of the substrate body can be ensured and there is no need to install a large-scale equipment and the like. SOLUTION: A supplying stage 1, a pasting stage 10, and a handling mechanism 30 are built in a portable case, and the supplying stage 1 and the pasting stage 10 are arranged in a line. Between these supplying stage 1 and pasting stage 10, a semiconductor wafer which forms the substrate body, a substrate holder, and the substrate holder which removably holds the semiconductor wafer are optionally handled by a hand 32 of the handling mechanism 30. Since a rigid substrate holder 22 is used, various treatments can be performed by easily giving the rigidity to the semiconductor wafer, and the semiconductor wafer can be handled and can be transferred. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009170761(A) 申请公布日期 2009.07.30
申请号 JP20080008938 申请日期 2008.01.18
申请人 SHIN ETSU POLYMER CO LTD 发明人 HOSONO NORIYOSHI
分类号 H01L21/673;H01L21/677;H01L21/683 主分类号 H01L21/673
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