Photosensitive Resin Composition and Photosensitive Film

摘要

Disclosed is a photosensitive resin composition comprising an alkali-soluble resin, wherein the dissolution rate of the alkali-soluble resin in an aqueous sodium carbonate solution is not less than 0.04 mum/sec. When a photosensitive layer having a thickness of 30 mum is formed by applying the photosensitive resin composition onto a base and removing the solvent by heating, and thus-obtained photosensitive layer is irradiated with an active ray of 1000 mJ/cm2 or less, the dissolution rate of the portion irradiated with the active ray in the photosensitive layer made of the photosensitive resin composition is not less than 0.22 mum/sec and the film residual rate of the portion not irradiated with the active ray is not less than 90%.